High Temperature Vacuum Oven for Semiconductor industry

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IVO-2000S 


Purpose

  • Vacuum oven for semiconductor cleaning




Feature

  • 8-channel precise temperature control (includes individual shelf control functionality)
  • Automatic VENT function after vacuum maintenance setting
  • Includes manual valves for nitrogen gas and air supply


Specification

ModelVO-2000S 
Chamber Volume 2000L 
Heater Power (kW) 34kW 
Temperature Range 40~400℃
Control 0.1℃ 
Accuracy±2℃ at 100℃
 SensorK-type
 Stability±1.0℃
 Heat up Time5℃ per 30 mins (empty)
Vacuum Range 0~760 Torr Digital type 
DegreeAbout 0.1 Torr 
 Material Interior Stainless Steel  
 Exterior Steel, 1.2t, double painted & baked  
 HeaterSUS Pipe Heater 
Heating MethodSUS Sheath Heater 
Shelf2
Dimension
(W x D x H, mm) 
Internal 1000 x 2000 x 1000
External  1680 x 2310 x 1800
Power380V / 3P/ 60Hz 
Weight (kg)About 500kg


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 *Vacuum Range Options: 10^-3Torr or higher is also available. 

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Company : IREA TECH   Ceo : Si Hyeok Woo
  Tel : (+82)42-627-9609
  Fax : (+82)42-628-9609

Address : 43, Haso-ro, Dong-gu, Daejeon
  Email : sales@ireatech.com

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