Vacuum Oven for Polyimide Baking

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IVO-100S


Purpose

  • Polyimide Baking System! 




Feature

  • Polyimide Baking 
  • PCB & Semiconductor Baking




Specification

ModelIVO-100S 
Chamber Volume (ℓ)100L 
Heater Power (kW)19kW
TemperatureRange 40~400℃ (Recommended at 380℃) 
Control 0.1℃ 
Accuracy±2℃ at 100℃ 
ControllerDigital PID controls system 
SensorK-type 
Stability±1.0℃
Heat up Time200℃ within 30 mins  (only chamber empty status)
VacuumRange 0~760 Torr Digital type 
DegreeAbout 0.1 Torr 
MaterialInterior Stainless Steel 
Exterior Steel, 1.2t, double painted & baked 
HeaterSUS Pipe Heater 
Insulation Mineral Wool (50mm)
Door PackingMolded heat resistant silicone rubber 
Inner glassTempered safety glass, 25mm 
Heating MethodSUS Sheath heater  2.5kW 1ea /3kW 2ea / 3.5kW 3ea 
Shelf2 
Dimension
(W x D x H, mm) 
Internal450 x 500 x 550 
External 1100 x 1260 x 1840
Power380V / 3P/ 60Hz 
Weight (kg) About 500kg 




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*Polyimide Baking

*PCB & Semiconductor Baking for antioxidizing and heating

Maintains great quality by having no contact with oxygen in the chamber




Advantages

Constant Vacuum, Hot Nitrogen
→Uniform Solvent Evaporation
Welded on insulation
→Protects chamber from contamination
Thick Insulation (100-150mm)
→For less air leakage & heat loss
Consistency
→Solvent is efficiently pulled off
Almost No Oxygen
→Nitrogen buffering between air outside & chamber inside
Clean Process
→Class 1 environment




Vacuum Range Options

10^-3 Torr or higher is also available. 

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